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SiAl Rotating target material

  • SiAl Rotating target material
  • SiAl Rotating target material

Product Details

Application: touch panel, display device, thin film PV

Physical Characteristics

Parameters Typical Value
Production Methodology Plasma spraying
Composition 90wt% Si+10wt% Al
92wt% Si + 8wt% Al
Purity >99.9wt%
Density ≥2.2g/cm3
Electrical resistivity <0.1 Ω·cm
Metal impurity Fe≤200ppm, Ni≤50ppm, Cu≤50ppm.
Total≤1000ppm
Gas impurity O≤6000ppm, N≤1000ppm
Dimension Maximal OD: 159mm, Length: 4000mm.

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