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Si Rotating target material

  • Si Rotating target material
  • Si Rotating target material

Product Details

Application: Touch panel, display device, thin film PV

Physical Characteristics

Parameters Typical Value
Production Methodology Plasma spraying
Composition Si
Purity >99.99wt%
Density ≥2.2g/cm3
Electrical resistivity <40 Ω·cm
Metal impurity Fe≤100ppm, Cu≤10ppm, Al≤20ppm.
Total≤100ppm
Gas impurity O≤2500ppm, N≤500ppm
Dimension Maximal OD: 151mm, Length: 4000mm.

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