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High performance oxidative zinc base magnetron sputtering target material production technology

On December 12, 2012, ningbo material belongs to new energy technology research institute of Chinese academy of sciences to complete the "high-performance oxidized zinc base magnetron sputtering target material production technology" project passed appraisal of achievement of new product new technology.

Academician of Chinese academy of sciences jun-hao chu and from zhejiang university, Shanghai jiaotong university and other research institutes and enterprises of the experts identified seven examines the project production site, listen to the work of project reports, technical reports, product testing report, science and technology novelty search report, user opinions, etc., after reviewing the data and field investigation, agreed that the project has important innovation, technology reached the international advanced level, agree through identification.

"High-performance oxide zinc base magnetron sputtering target material production technology" project for batch related downstream companies both at home and abroad to provide quality oxide zinc base sputtering target material, in the flat display, thin film solar cells, semiconductor devices, building low-e glass and coated glass photoelectric information industry has important applications, such as wide prospect of market. Five years r&d team, created a controllable synthesis of nanometer powders from raw material to the large size of target and the integrated application of technology of dense sintering molding line, product technology has four authorized invention patent, form the core of intellectual property rights, has industrialization production conditions.

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